Glass substrate for magnetic disk and manufacturing method thereof

ABSTRACT

The present invention provides a method for efficiently manufacturing a glass substrate for magnetic disk having good accuracy of a surface irregularity and an impact resistance. The method includes the steps of: performing press forming to molten glass to prepare a sheet glass material, the sheet glass material having a roughness of the principal surface of 0.01 μm or less and target flatness of a glass substrate for magnetic disk; chemically strengthening the sheet glass material by dipping the sheet glass material in a chemically strengthening salt, thereby preparing a disk substrate; polishing the principal surfaces of the disk substrate. A thickness of the sheet glass material prepared in the press forming step is larger than a target thickness of the glass substrate for magnetic disk by a polishing quantity of the principal surface polishing step.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation of U.S. patent application Ser. No.12/979,176, filed on Dec. 27, 2010, which is based upon and claims thebenefit of priority of the prior Japanese Patent Application No.2009-299249, filed on Dec. 29, 2009, the entire contents of each areincorporated herein by reference.

FIELD

The present invention relates to a glass substrate for magnetic diskhaving a pair of principal surfaces and a manufacturing method thereof.

BACKGROUND

Recently, a hard disk device is incorporated in a personal computer, anotebook personal computer, and a DVD (Digital Versatile Disc) recordingapparatus in order to record data. Particularly, in the hard disk deviceused in an apparatus such as the notebook personal computer based onportability, a magnetic disk in which a magnetic layer is provided on aglass substrate is used, and magnetic recording information is recordedin or read from a magnetic layer using a magnetic head (DFH (DynamicFlying Height) head) that is slightly floated on a surface of themagnetic disk surface. A glass substrate is suitably used as thesubstrate for the magnetic disk because substrate is hardly plasticallydeformed compared with a metallic substrate.

The magnetic recording density is being increased in order to correspondto a demand for an increase of a storage capacity in the hard diskdevice. For example, a magnetic recording information area is finelyformed using a perpendicular magnetic recording system in which amagnetization direction of the magnetic layer is oriented toward adirection perpendicular to the substrate surface, which allows thestorage capacity to be increased in one disk substrate. In order tocorrespond to the further increase of the storage capacity, a floatingdistance of the magnetic head from the magnetic recording surface isextremely shortened to form the fine magnetic recording informationarea. In the substrate of the magnetic disk, the magnetic layer isformed flat such that the magnetization direction of the magnetic layeris oriented toward the direction substantially perpendicular to thesubstrate surface. Therefore, the glass substrate is formed such thatsurface irregularity of the glass substrate is decreased as much aspossible.

The shortened floating distance of the magnetic head easily causes ahead crush trouble or a thermal asperity trouble. Because these troublesare generated by the micro irregularity or a particle on the magneticdisk surface, the glass substrate is formed such that the surfaceirregularity in an end face is also decreased as much as possible inaddition to the principal surface.

A press forming method and a floating method are well known as a methodfor manufacturing the sheet glass material that becomes a base of theglass substrate used in the magnetic disk.

For example, Japanese Patent No. 3709033 discloses a press formingmethod as the method for manufacturing the glass material that becomesthe base of the glass substrate used in the magnetic disk. In thedisclosed press forming method, a glass gob made of molten glass issupplied onto a lower die that is a backing gob forming die, and pressforming is performed to the glass gob using the lower die and an upperdie that is a counter gob forming die. More specifically, the glasssubstrate used in the magnetic disk is manufactured by the followingmethod: a glass gob made of molten glass is supplied onto a lower diethat is a backing gob forming die; press forming is performed to theglass gob to prepare a sheet glass material using the lower die and anupper die that is a counter gob forming die; and the sheet glassmaterial is formed into am information recording medium glass substrate.

However, the surface irregularity of the sheet glass material formed inaccordance with the conventional method is not sufficient for thesurface irregularity accuracy of the principle surfaces for the highdensity of the magnetic recording and the fine magnetic recordinginformation area.

For example, in forming the sheet glass material, a mold release agentis applied to the die surface in order to prevent the glass materialfrom fusing to the die surfaces of the upper die and lower die. Thesurface roughness of the principal surface of the sheet glass materialis increased because of the mold release agent. There is a large surfacetemperature difference between the upper die and the lower die, and thelower die to which the glass gob (a lump of the glass material) issupplied becomes high temperature. Because the surface temperaturedifference causes a temperature distribution in a thickness direction ofthe formed sheet glass material and in a plane of the plate, a shrinkagequantity of the sheet glass material that is taken out from the die andcooled also has a distribution in the thickness direction of the formedsheet glass material and in the plane of the plate. The sheet glassmaterial is easy to warp, and therefore good flatness of the formedsheet glass material is not achieved.

With the sheet glass material obtained by the conventional press formingmethod, it is necessary that the flatness of the sheet glass material beimproved up to the flatness required as a glass substrate for magneticdisk. Therefore, a grinding process is performed to the sheet glassmaterial after the press forming, thereby improving the flatness of theglass material. However, performing the grinding process becomes anadditional process in the manufacturing of the glass substrate formagnetic disk, and further performing the grinding process caused a“roll-off problem”.

That is, a machining allowance (ground quantity) is increased in thegrinding process because the flatness is not so good with theconventional press forming method. For example, the machining allowanceis about 200 μm with the conventional press forming method. When themachining allowance is increased in the grinding process, a deep crackis generated in the surface of the sheet glass material. Therefore, in apolishing process subsequent to the grinding process, the machiningallowance (polishing quantity) is inevitably increased such that thedeep crack is not left. Here, when the machining allowance is increasedin the polishing process in which the loose abrasive grain and the resinpolisher are used, the neighborhood in the outer circumferential edgeportion is rounded in the principal surface of the sheet glass materialto cause a “roll-off problem” of the edge portion. That is, because theneighborhood in the outer circumferential edge portion is rounded in thesheet glass material, a distance between the magnetic layer and themagnetic head in the neighborhood of the outer circumferential edgeportion becomes larger than the floating distance of the magnetic headin another portion of the glass substrate when the magnetic disk isprepared using the sheet glass material as the glass substrate. Thesurface irregularity is generated because the neighborhood of the outercircumferential edge portion has the rounded shape. As a result, therecording and reading operations of the magnetic head are not preciselyperformed in the magnetic layer in the neighborhood of the outercircumferential edge portion. That is, the recordable and readableregions are reduced. The above is the “roll-off problem”.

Because the sheet glass material having the sufficient flatness is notobtained with the conventional press forming method, it takes arelatively longer time to perform the grinding process that is thepost-process, and then the “roll-off problem” is generated by thegrinding process.

On the other hand, with the floating method, the sheet glass material isobtained by continuously flowing the molten glass in a bath filled withmolten metal such as tin. The molten glass is flown along a travelingdirection in the bath to which an exact temperature operation isperformed, and the belt-shaped glass ribbon is formed while finallyadjusted to desired thickness and width. The sheet glass material thatbecomes the base of the glass substrate used in the magnetic disk is cutout from the glass ribbon. Because the tin surface in the bath is kepthorizontal, the sheet glass material obtained by the floating method hasthe sufficiently high surface flatness.

In the other aspect, a predetermined impact resistance is required forthe glass substrate used in the magnetic disk. Therefore, a chemicallystrengthening process is performed to the sheet glass material thatbecomes the base of the glass substrate in order to improve the impactresistance of the glass substrate.

The chemically strengthening process is performed as follows. A mixedsolution of potassium nitrate and sodium sulfate is used as a chemicallystrengthening solution. For example, the chemically strengtheningsolution is heated to 300° C. to 400° C. For example, after the washedsheet glass material is preheated to 200° C. to 300° C., the sheet glassmaterial is dipped in the chemically strengthening solution for 3 to 4hours. Therefore, ion replacement with sodium ion and potassium ionoccurs in the surface layer of the glass material to form a compressivestress layer. Accordingly, the crack that is possibly generated in thesurface of the glass material hardly progresses to the inside of theglass material. The compressive stress layer formed through thechemically strengthening process has the thickness of about 50 to 200μm.

However, when the chemically strengthening process is performed to theextremely-high-flatness sheet glass material obtained by the floatingmethod, unfortunately a warp is generated in the sheet glass material.That is, in the sheet glass material obtained by the floating method, atin diffusion layer having a thickness of about 10 to 50 μm isinevitably formed in one of the surfaces of the sheet glass material bytin used as the molten metal, and the tin diffusion layer is not formedin the other surface. When the chemically strengthening process isperformed to the sheet glass material, the warp is generated to degradethe flatness because the compressive stress layers formed both thesurfaces differs from each other by the presence or absence of tindiffusion layer. Therefore, when the chemically strengthening isperformed, it is necessary that a grinding process for removing the tindiffusion layer be performed to the surface in which the tin diffusionlayer is produced in the sheet glass material obtained by the floatingmethod.

In summary, with the conventional press forming method, the grindingprocess is required because the sheet glass material having thesufficiently flatness is not obtained. With the floating method,although the sheet glass material having the sufficiently flatness isobtained, the grinding process is required to remove the tin diffusionlayer of the material surface.

In the above regard, an object of the invention is to provide a methodfor efficiently manufacturing the glass substrate for magnetic diskhaving the good surface irregularity accuracy and impact resistance.

SUMMARY OF THE INVENTION

In accordance with an aspect of the invention, there is provided amethod for manufacturing a glass substrate for magnetic disk including apair of principal surfaces, the method including the steps of:performing press forming to molten glass to prepare a sheet glassmaterial, the sheet glass material having a roughness of the principalsurface of 0.01 μm or less and target flatness of a glass substrate formagnetic disk; chemically strengthening the sheet glass material bydipping the sheet glass material in a chemically strengthening saltcontaining an alkali metal ion to form a compressive stress layer atleast on the principal surfaces of the sheet glass material, therebypreparing a disk substrate; polishing the principal surfaces of the disksubstrate by pressing the polishing pad against the principal surfacesof the disk substrate while supplying a polishing solution including apolishing material between the disk substrate and the polishing pad, andrelatively moving the disk substrate and the polishing pad. In themethod, a thickness of the sheet glass material prepared in the pressforming step is larger than a target thickness of the glass substratefor magnetic disk by a polishing quantity of the principal surfacepolishing step.

Accordingly, the formed sheet glass material has the principal surfaceroughness of 0.01 μm or less and the target flatness of the glasssubstrate for magnetic disk. The thickness of the sheet glass materialis larger than the target thickness of the glass substrate for magneticdisk by the polishing quantity of the glass substrate for magnetic disk.Because the sheet glass material obtained through the press forming stephas the good surface irregularity accuracy, only the polishing processis performed to the sheet glass material in the surface treatmentprocess, but the grinding process having the machining allowance largerthan that of the polishing process is not performed to the principalsurface. The good impact resistance is obtained by the compressivestress layer formed through the chemically strengthening process.Therefore, the glass substrate for magnetic disk having the good surfaceirregularity accuracy and impact resistance can efficiently be produced.

Preferably the press forming step includes the steps of: causing a lumpof the molten glass to fall down; and forming the sheet glass materialby performing the press forming to the lump while sandwiching the lumpbetween surfaces of a pair of dies from both sides of a falling path ofthe lump, the dies being disposed opposite each other, the dies beingset to substantially same temperature. Accordingly, the sheet glassmaterial having the principal surface roughness of 0.01 μm or less, theflatness necessary as the glass substrate for magnetic disk, and thetarget thickness of the glass substrate for magnetic disk can beprepared by the press forming.

Preferably, the pair of dies is opened immediately after the pressforming is performed to the lump while the lump is sandwiched betweenthe surfaces of the pair of dies in the step of forming the sheet glassmaterial.

Preferably, the target flatness as the glass substrate for magnetic diskis 4 μm or less.

Preferably, the manufacturing method of glass substrate for magneticdisk further comprises the step of scribing the sheet glass materialbetween the forming step and the polishing step.

Preferably, a glass substrate for magnetic disk that is manufactured bythe above manufacturing method of glass substrate for magnetic disk hasthe principal surface with the flatness of 4 μm or less and theroughness of 0.2 nm or less.

The object and advantages of the invention will be realized and attainedby means of the elements and combinations particularly pointed out inthe claims.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory and arenot restrictive of the invention, as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

Referring now to the attached drawings which form a part of thisoriginal disclosure:

FIG. 1A to FIG. 1C are views illustrating a magnetic disk prepared usinga glass substrate for magnetic disk according to an embodiment of theinvention;

FIG. 2A to FIG. 2D are views illustrating a surface irregularity in asheet glass material or a glass substrate;

FIG. 3 is a view illustrating a flow of a manufacturing method for glasssubstrate for magnetic disk according to an embodiment of the invention;

FIG. 4 is a plan view of an apparatus used in press forming of FIG. 3;

FIG. 5A to FIG. 5C are views illustrating an example of the pressforming performed by the apparatus of FIG. 4;

FIG. 6A to FIG. 6C are views illustrating another example of the pressforming performed by the apparatus of FIG. 4;

FIG. 7A to FIG. 7D are views illustrating still another example of thepress forming performed by the apparatus of FIG. 4;

FIG. 8A to FIG. 8C are views illustrating still another example of thepress forming performed by the apparatus of FIG. 4; and

FIG. 9A and FIG. 9B are views illustrating a double-side polishingapparatus used in first polishing and second polishing of FIG. 3.

DESCRIPTION OF EMBODIMENT(S)

A manufacturing method of glass substrate for magnetic disk and a glasssubstrate for magnetic disk according to an embodiment of the presentinvention will be described in detail below.

FIG. 1A to FIG. 1C are views illustrating a magnetic disk that isprepared using a glass substrate for magnetic disk of the embodiment ofthe invention.

(Magnetic Disk and Glass substrate for Magnetic Disk)

In a magnetic disk 1 of FIG. 1A used in a hard disk device, layers 3Aand 3B including at least magnetic layers (perpendicular magneticrecording layers) are formed on principal surfaces of a ring glasssubstrate 2 as illustrated in FIG. 1B. More specifically, although notillustrated in FIG. 1, an adhesive layer, a soft magnetic layer, anon-magnetic underlying layer, the perpendicular magnetic recordinglayer, a protective layer, and a lubricant layer are sequentiallystacked. For example, a Cr alloy is used in the adhesive layer, and theadhesive layer acts as a bonding layer to the glass substrate 2. Forexample, a CoTaZr alloy is used as the soft magnetic layer, a granularnon-magnetic layer is used as the non-magnetic underlying layer, and agranular magnetic layer is used as the perpendicular magnetic recordinglayer. For example, a material containing carbon hydride is used as theprotective layer, and a fluorine resin is used as the lubricant layer.

The magnetic disk 1 will be described with a more specific example. ACrTi adhesive layer, a CoTaZr/Ru/CoTaZr soft magnetic layer, a CoCrSiO₂granular non-magnetic underlying layer, a CoCrPt—SiO₂.TiO₂ granularmagnetic layer, and a carbon hydride protective layer are sequentiallydeposited in both the principal surfaces of the glass substrate 2 withan in-line type sputtering apparatus. A perfluoropolyether lubricantlayer is deposited on the uppermost layer by a dipping method to formthe magnetic layers 3A and 3B.

As illustrated in FIG. 1C, magnetic heads 4A and 4B of a hard diskdevice float from surfaces of the magnetic disk 1 by 5 nm in thecondition of high-speed rotation, for example, 7200 rpm, of the magneticdisk 1. That is, a distance H in FIG. 1C is 5 nm. At this point, themagnetic heads 4A and 4B record and read pieces of information in andfrom the magnetic layers. The floating of the magnetic heads 4A and 4Bcan closely record and read the information in and from the magneticlayer of the magnetic disk 1 without sliding the magnetic heads 4A and4B onto the magnetic layer, thereby realizing a fine magnetic recordinginformation area and high density of the magnetic recording.

At this point, a central portion of the glass substrate 2 of themagnetic disk 1 to an outer circumferential edge portion 5 are preciselyprocessed with target surface irregularity accuracy, and the magneticheads 4A and 4B can be precisely operated while the distance H of about5 nm is maintained.

A surface treatment process performed to the surface irregularity of theglass substrate 2 does not include a grinding process having arelatively large machining allowance, but only includes first polishingand second polishing processes having relatively small machiningallowances.

The principal surface of the glass substrate 2 used in the magnetic disk1 has surface irregularity in which flatness is 4 _82 m or less andsurface roughness is 0.2 nm or less. The flatness of 4 μm or less istarget flatness required for the glass substrate for magnetic disk as afinal product. For example, the flatness can be measured with a flatnesstester FT-900 manufactured by NIDEK CO., LTD. The roughness of theprincipal surface is expressed by arithmetic average roughness Radefined by JIS B0601:2001. When the roughness ranges from 0.006 μm to200 μm, for example, the roughness is measured with a roughnessmeasuring machine SV-3100 manufactured by Mitutoyo Corporation, and theroughness can be computed by a method defined by JIS B0633:2001. As aresult of the measurement, when the roughness is 0.03 μm or less, forexample, the roughness is measured with a scanning probe microscope(atomic force microscope) manufactured by SII Nano Technology Inc, andthe roughness can be computed by a method defined by JIS R1683:2007.

In the embodiment, the sheet glass material of pre-polishing process wasmeasured with the roughness measuring machine, and the glass substrateof post-polishing was measured with the scanning probe microscope(atomic force microscope).

FIG. 2A to FIG. 2D are views illustrating the surface irregularity. Thesurface irregularity can be classified into four irregularitiesaccording to a wavelength of the irregularity.

Specifically, the surface irregularity is classified into heave havingthe largest wavelength (wavelength of about 0.6 μm to about 130 mm),waviness (wavelength of about 0.2 μm to about 1 mm), micro-waviness(wavelength of 0.1 μm to 1 mm), and roughness (wavelength of 10 nm orless).

The heave can be expressed by the flatness as an index, and theroughness can be expressed by the arithmetic average roughness Ra as anindex.

With the manufacturing method of the embodiment, the sheet glassmaterial of pre-polishing process obtained after the press forming hasthe following property: the roughness of the principal surface is 0.01μm or less, and the flatness has the target flatness of the glasssubstrate for magnetic disk. The sheet glass material prepared by thepress forming has a thickness larger than the target thickness of theglass substrate for magnetic disk by the polishing quantity of thepolishing process. That is, the thickness of the sheet glass material ofthe post-press forming is the thickness added to the target thickness ofthe glass substrate for magnetic disk of the final product by the smallmachining allowance of the polishing process. The glass substrate formagnetic disk is prepared without performing the grinding process foradjusting the flatness and the thickness to the sheet glass material ofthe post-press forming. For example, “the target flatness of the glasssubstrate for magnetic disk” is 4 μm or less. The reason the surfaceflatness of the sheet glass material is set to 4 μm or less is that theflatness of the glass substrate 2 used in the magnetic disk 1 ismaintained and therefore the magnetic heads 4A and 4B can properlyperform the recording and reading operations. For example, the sheetglass material having the principal surface roughness of 0.01 μm orless, the target flatness of the glass substrate for magnetic disk, andthe thickness larger than the target thickness of the glass substratefor magnetic disk by the polishing quantity of the principal surfacepolishing, can be achieved by the press forming of the embodiment. Onthe other hand, the sheet glass material having the principal surfaceroughness of 0.01 μm or less, the target flatness of the glass substratefor magnetic disk, and the thickness larger than the target thickness ofthe glass substrate for magnetic disk by the polishing quantity of theprincipal surface polishing, cannot be achieved by the conventionalpress forming.

According to the manufacturing method of the embodiment, after the pressforming, the glass substrate for magnetic disk having the flatness of 4μm or less and the surface roughness of 0.2 nm or less can be obtainedthrough the first polishing process and the second polishing process.

At this point, the reason the surface roughness of the sheet glassmaterial of the post-press forming is set to 0.01 μm or less is becausesurface roughness can be adjusted to 0.2 nm by the two-time polishingprocess without increasing the machining allowance. Further, when thesurface roughness is 0.01 μm or less, the scribing can efficiently beperformed to the sheet glass material.

The surface irregularity of a sheet glass material G can be achieved byadjusting the surface roughness of the die in the press forming.

For example, aluminosilicate glass, soda-lime glass, and borosilicateglass can be used as a material for the glass substrate 2 of themagnetic disk 1. Particularly, the aluminosilicate glass can be suitablyused in that chemically strengthening can be performed and in that theglass substrate for magnetic disk excellent for the flatness of theprincipal surface and the strength of the substrate can be prepared.

A chemically strengthened glass material mainly containing by molarpercent of 57 to 74% SiO₂, 0 to 2.8% ZnO₂, 3 to 15% Al₂O₃, 7 to 16%LiO₂, and 4 to 14% Na₂O is suitably used as the aluminosilicate glass.

(Manufacturing Method of Glass Substrate for Magnetic Disk)

FIG. 3 is a view illustrating a flow of a manufacturing method for glasssubstrate for magnetic disk of the embodiment. In the flow of FIG. 3, afirst polishing process in Step S50 and a second polishing process inStep S70 constitute a surface treatment process of performingmirror-surface finishing to the principal surface of the sheet glassmaterial. The sheet glass material is prepared by the press forming(Step S10). The prepared sheet glass material has the principal surfaceroughness of 0.01 μm or less, the target flatness of the glass substratefor magnetic disk, and a thickness larger than the target thickness ofthe glass substrate for magnetic disk by a polishing quantity of theprincipal surface polishing.

For example, the press forming is performed with an apparatusillustrated in FIG. 4 and FIG. 5. The press forming can also beperformed with an apparatus illustrated in FIG. 6, FIG. 7, and FIG. 8.FIG. 4 is a plan view of an apparatus 101 used in the press forming,FIGS. 5 to 8 are views illustrating a state in which the apparatusperforms the press forming when viewed from a side face.

(a) Press Forming Process

An apparatus 101 illustrated in FIG. 4 includes four sets of press units120, 130, 140, and 150 and a cutting unit 160. The cutting unit 160 isprovided on a path of the molten glass that flows out from a moltenglass outflow port 111. In the apparatus 101, a lump of the molten glasscut by the cutting unit 160 is caused to fall down, and the lump ispressed from both sides of the falling path of the lump while sandwichedbetween surfaces of a pair of dies set to the substantially sametemperature, thereby forming the sheet glass material.

Specifically, as illustrated in FIG. 4, in the apparatus 101, the foursets of press units 120, 130, 140, and 150 are provided at intervals of90 degrees around the molten glass outflow port 111.

As used herein, “the substantially same temperature” means that anabsolute value of a temperature difference between a temperature at apress forming surface of first press forming die constituting the pairof dies and a temperature at a press forming surface of a second pressforming die is 10° C. or less. More preferably the absolute value of thetemperature difference is 5° C. or less, most preferably the absolutevalue of the temperature difference is 0° C. When a temperaturedistribution exists in the press forming surface, “the temperature atthe press forming surface” means a temperature near a center portion ofthe press forming surface.

Preferably the lump is brought into contact with the surfaces of thepair of dies in substantially the same timing, and the press forming isperformed while the lump is sandwiched between the surfaces of the pairof dies in the substantially same timing. “The lump is brought intocontact with the surfaces of the pair of dies in substantially the sametiming” means that the absolute value of the time difference between thetime the molten glass lump comes into contact with one of the pressforming surfaces and the time the molten glass lump comes into contactwith the other press forming surface is 0.1 second or less. Morepreferably the absolute value of the time difference 0.05 second orless, most preferably the absolute value of the time difference is 0second.

Each of the press units 120, 130, 140, and 150 is driven by a movingmechanism (not illustrated) so as to be able to proceed and retreat withrespect to the molten glass outflow port 111. That is, each of the pressunits 120, 130, 140, and 150 can be moved between a catch position and aretreat position. The catch position (position in which the press unit140 is drawn by a solid line in FIG. 4) is located immediately below themolten glass outflow port 111. The retreat position (positions in whichthe press units 120, 130, and 150 are drawn by solid lines in FIG. 4 anda position in which the press units 140 is drawn by a broken line inFIG. 4) is located away from the molten glass outflow port 111.

The cutting unit 160 is provided on a path of the molten glass betweenthe catch position and the molten glass outflow port 111. The cuttingunit 160 forms the lump (hereinafter also referred to as “gob”) of themolten glass by cutting a proper quantity of the molten glass flowingout from the molten glass outflow port 111. The cutting unit 160includes a pair of cutting blades 161 and 162. The cutting blades 161and 162 are driven so as to intersect each other on the path of themolten glass at constant timing. When the cutting blades 161 and 162intersect each other, the molten glass is cut to obtain the gob. Theobtained gob falls down toward the catch position.

The press unit 120 includes a first die 121, a second die 122, a firstdriving unit 123, and a second driving unit 124. Each of the first die121 and the second die 122 is a plate-shaped member including a surfaceused to perform the press forming for the gob. The first die 121 and thesecond die 122 are disposed such that normal directions of the surfacesbecome substantially horizontal, and such that the surfaces becomeparallel to each other. The first driving unit 123 causes the first die121 to proceed and retreat with respect to the second die 122. On theother hand, the second driving unit 124 causes the second die 122 toproceed and retreat with respect to the first die 121. Each of the firstdriving unit 123 and the second driving unit 124 includes a mechanismfor causing the surface of the first driving unit 123 and the surface ofthe second driving unit 124 to be rapidly brought close to each other,for example, a mechanism in which an air cylinder or a solenoid and acoil spring are combined.

Because the structures of the press units 130, 140, and 150 are similarto that of the press unit 120, the descriptions of the press units 130,140, and 150 are omitted.

After each press unit moves to the catch position, the falling gob issandwiched between the first die and the second die by driving the firstdriving unit and the second driving unit, and the gob is formed into apredetermined thickness while rapidly cooled, thereby preparing thedisk-shaped sheet glass material G. Then, after the press unit moves tothe retreat position, the first die and the second die are separated tocause the formed sheet glass material G to fall down. A first conveyer171, a second conveyer 172, a third conveyer 173, and a fourth conveyer174 are provided below the retreat positions of the press units 120,130, 140, and 150, respectively. Each of the first to fourth conveyers171 to 174 receive the sheet glass material G falling down from thecorresponding press unit, and the conveyer conveys the sheet glassmaterial G to an apparatus (not illustrated) of the next process.

The apparatus 101 is configured such that the press units 120, 130, 140,and 150 sequentially move to the catch position and move to the retreatposition while the gob is sandwiched, so that the sheet glass material Gcan continuously be formed without waiting for the cooling of the sheetglass material G in each press unit.

FIG. 5A to FIG. 5C more specifically illustrate the press formingperformed by the apparatus 101. FIG. 5A is a view illustrating the statebefore the gob is made, FIG. 5B is a view illustrating the state inwhich the gob is made by the cutting unit 160, and FIG. 5C is a viewillustrating the state in which the sheet glass material G is formed bypressing the gob.

As illustrated in FIG. 5A, a molten glass material L_(G) continuouslyflows out from the molten glass outflow port 111. At this point, thecutting unit 160 is driven in predetermined timing to cut the moltenglass material L_(G) using the cutting blades 161 and 162 (FIG. 5B).Therefore, the cut molten glass becomes a substantially spherical gobG_(G) due to a surface tension thereof. In the example illustrated inFIG. 5, an outflow quantity per time of the molten glass material L_(G)and a driving interval of the cutting unit 160 are adjusted such that agob G_(G) having a radius of about 10 mm is formed every time thecutting unit 160 is driven.

The made gob G_(G) falls down toward a gap between the first die 121 andsecond die 122 of the press unit 120. At this point, the first drivingunit 123 and the second driving unit 124 (see FIG. 4) are driven suchthat the first die 121 and the second die 122 come close to each otherat the timing the gob G_(G) enters the gap between the first die 121 andthe second die 122. Therefore, as illustrated in FIG. 5C, the gob G_(G)is captured (caught) between the first die 121 and the second die 122.An inner circumferential surface 121 a of the first die 121 and an innercircumferential surface 122 a of the second die 122 come close to eachother with a micro gap, and the gob G_(G) sandwiched between the innercircumferential surface 121 a of the first die 121 and the innercircumferential surface 122 a of the second die 122 is formed into athin-plate shape. A projected spacer 122 b is provided in the innercircumferential surface 122 a of the second die 122 in order to keep thegap between the inner circumferential surface 121 a of the first die 121and the inner circumferential surface 122 a of the second die 122constant. A gap between the inner circumferential surface 121 a of thefirst die 121 and the inner circumferential surface 122 a of the seconddie 122 are adjusted such that the sheet glass material having thethickness larger than the target thickness of the glass substrate formagnetic disk by the polishing quantity of the principal surfacepolishing can be prepared.

A temperature control mechanism (not illustrated) is provided in each ofthe first die 121 and second die 122, and temperatures at the first die121 and second die 122 is retained sufficiently lower than a glasstransition temperature T_(G) of the molten glass L_(G).

A time until the gob G_(G) is completely confined between the first die121 and the second die 122 after the gob G_(G) comes into contact withthe inner circumferential surface 121 a of the first die 121 or theinner circumferential surface 122 a of the second die 122, is asextremely short as about 0.06 second in the apparatus 101. Therefore,the gob G_(G) is formed into the substantially disk shape by spreadingalong the inner circumferential surface 121 a of the first die 121 andthe inner circumferential surface 122 a of the second die 122 within anextremely short time, and the gob G_(G) is rapidly cooled and solidifiedin the form of amorphous glass, thereby preparing the disk-shaped sheetglass material G. In the embodiment, for example, the sheet glassmaterial G is a disk-shaped plate having a diameter of 75 to 80 mm and athickness of about 1 mm.

After the first die 121 and the second die 122 are closed, the pressunit 120 quickly moves to the retreat position, instead the press unit130 moves to the catch position, and the press unit 130 performs thepressing to the gob G_(G).

After the press unit 120 moves to the retreat position, the first die121 and the second die 122 are kept closed until the sheet glassmaterial G is sufficiently cooled (until the sheet glass material Gbecomes at least a temperature below a yield point). Then, the firstdriving unit 123 and the second driving unit 124 are driven to separatethe first die 121 and the second die 122, the sheet glass material Gfalls down from the press unit 120, and the conveyer 171 located belowthe press unit 120 receives the sheet glass material G (see FIG. 4).

As described above, in the apparatus 101, the first die 121 and thesecond die 122 are closed within a time as extremely short as 0.1 second(about 0.06 second), and the molten glass substantially simultaneouslycomes into contact with the whole of the inner circumferential surface121 a of the first die 121 and the whole of the inner circumferentialsurface 122 a of the second die 122. Therefore, the innercircumferential surface 121 a of the first die 121 and the innercircumferential surface 122 a of the second die 122 are not locallyheated, and a deformation is hardly generated in the innercircumferential surface 121 a and the inner circumferential surface 122a. Because the molten glass is formed into the disk shape before theheat transfers from the molten glass to the first die 121 and the seconddie 122, a temperature distribution of the formed molten glass becomessubstantially even. Therefore, in cooling the molten glass, theshrinkage quantity of the glass material has the small distribution, andthe large deformation is not generated in the sheet glass material G.Accordingly, the principal surface flatness of the prepared sheet glassmaterial G is improved better than that of the sheet glass materialprepared by the conventional press forming, and the principal surfaceflatness of the prepared sheet glass material G can be set to 4 μm orless.

The surface roughness of the inner circumferential surface 121 a and thesurface roughness of the inner circumferential surface 122 a areadjusted such that the arithmetic average roughness Ra of the sheetglass material G is 0.01 μm or less.

In the example illustrated in FIG. 5, the substantially spherical gobG_(G) is formed by cutting the flowing-out molten glass L_(G) using thecutting blades 161 and 162. However, when viscosity of the molten glassmaterial L_(G) is small with respect to a volume of the gob G_(G) to becut, the glass does not become the substantially spherical shape only bycutting the molten glass L_(G), and the gob is not formed. In suchcases, a gob forming die is used to form the gob.

FIGS. 6A to 6C are views illustrating a modification of the embodimentof FIG. 5. The gob forming die is used in the modification. FIG. 6A is aview illustrating the state before the gob is made, FIG. 6B is a viewillustrating the state in which the gob G_(G) is made by the cuttingunit 160 and a gob forming die 180, and FIG. 6C is a view illustratingthe state in which the press forming is performed to the gob G_(G) tomake the sheet glass material G.

As illustrated in FIG. 6A, the path of the molten glass L_(G) to thepress unit 120 is closed by closing the blocks 181 and 182, and the lumpof the molten glass L_(G) cut with the cutting unit 160 is received by arecess 180C formed by the block 181 and 182. Then, as illustrated inFIG. 6B, the molten glass L_(G) that becomes the spherical shape in therecess 180C falls down toward the press unit 120 at one time by openingthe blocks 181 and 182. When falling down toward the press unit 120, thegob G_(G) becomes the spherical shape by the surface tension of themolten glass L_(G). As illustrated in FIG. 6C, during the fall of thegob G_(G), the spherical gob G_(G) is sandwiched between the first die121 and the second die 122 to perform the press forming, therebypreparing the disk-shaped sheet glass material G.

Alternatively, as illustrated in FIGS. 7A to 7D, in the apparatus 101,instead of using the cutting unit 160 illustrated in FIGS. 6A to 6C, amoving mechanism that moves the gob forming die 180 in an upstreamdirection or a downstream direction along the path of the molten glassL_(G) may be used. FIGS. 7A and 7B are views illustrating the statebefore the gob G_(G) is made, FIG. 7C is a view illustrating the statein which the gob G_(G) is made by the gob forming die 180, and FIG. 7Dis a view illustrating the state in which the press forming is performedto the gob G_(G) to make the sheet glass material G.

As illustrated in FIG. 7A, the recess 180C formed by the blocks 181 and182 receives the molten glass L_(G) flowing out from the molten glassoutflow port 111. As illustrated in FIG. 7B, the blocks 181 and 182 arequickly moved onto the downstream side of the flow of the molten glassL_(G) at predetermined timing, thereby cutting the molten glass L_(G).Then, as illustrated in FIG. 7C, the blocks 181 and 182 are separated atpredetermined timing. Therefore, the molten glass L_(G) retained by theblocks 181 and 182 falls down at one time, and the gob G_(G) becomes thespherical shape by the surface tension of the molten glass L_(G). Asillustrated in FIG. 7D, during the fall of the spherical gob G_(G), thespherical gob G_(G) is sandwiched between the first die 121 and thesecond die 122 to perform the press forming, thereby preparing thedisk-shaped sheet glass material G.

FIGS. 8A to 8C are views illustrating another modification in which,instead of the gob G_(G), a lump C_(P) of the optical glass heated by asoftening furnace (not illustrated) is caused to fall down and the pressforming is performed to the lump C_(P) while the lump C_(P) issandwiched from both sides between dies 221 and 222 during the fall ofthe lump C_(P). FIG. 8A is a view illustrating the state before the lumpof the heated optical glass is formed, FIG. 8B is a view illustratingthe state in which the lump of the optical glass falls down, and FIG. 8Cis a view illustrating the state in which the press forming is performedto the lump of the optical glass to make the sheet glass material G.

As illustrated in FIG. 8A, in an apparatus 201, a glass materialgrasping mechanism 212 conveys the lump C_(P) of the optical glass to aposition above a press unit 220. As illustrated in FIG. 8B, the glassmaterial grasping mechanism 212 releases the lump C_(P) of the opticalglass to cause the lump C_(P) of the optical glass to fall down. Asillustrated in FIG. 8C, during the fall of the lump C_(P) of the opticalglass, the lump C_(P) is sandwiched between the first die 221 and thesecond die 222 to perform the press forming. Because the first die 221and the second die 222 have the same configuration and action as thoseof the first die 121 and second die 122 illustrated in FIG. 5, thedescriptions are omitted.

(b) Scribing Process

After the press forming, scribing is performed to the formed sheet glassmaterial G as illustrated in FIG. 3 (Step S20).

As used herein, the scribing means that two concentric (insideconcentric and outside concentric) cutting-plane lines (scratch in theform of a line) are provided in the surface of the sheet glass materialG with a scriber made of a super alloy or diamond particles in order toobtain the donut-shape (ring-shape) of the formed sheet glass material Ghaving a predetermined size. The sheet glass material G scribed intotwo-concentric-circle shape is partially heated, and a portion outsidethe outside concentric circle and a portion inside the inside concentriccircle are removed by a difference in thermal expansion of the sheetglass material G, thereby obtaining the donut-shaped sheet glassmaterial.

As described above, the cutting-plane line can suitably be provided withthe scriber, because the sheet glass material G produced through the (a)press forming process has the roughness of 0.01 μm or less. In the casein which the roughness of the sheet glass material exceeds 1 μm, thescriber does not precisely trace on the surface, and cutting-plane linemay not be evenly provided. Even in such case, the sheet glass materialmay be prepared so as to have an outer diameter and circularity to anextent in which the scribing is not required, and a round hole is madein the sheet glass material with a core drill, thereby obtaining thering sheet glass material.

(c) Shape processing Process (Chamfering Process)

Then shape processing is performed to the scribed sheet glass material G(Step S30). The shape processing includes chamfering (chamfering ofouter circumferential end portion and inner circumferential endportion). In the chamfering process, the outer circumferential endportion and inner circumferential end portion of the disk-shaped sheetglass material G are chamfered using a diamond abrasive grain.

(d) Edge polishing Process

Then end face polishing is performed to the sheet glass material G (StepS40). In the end face polishing, the mirror-surface finishing isperformed to an inner-circumferential-side end face and anouter-circumferential-side end face of the sheet glass material G bybrush polishing. At this point, slurry that includes fine particles suchas cerium oxide as the loose abrasive grain is used. The contaminationof dust and damage such as a flaw are removed by performing the edgepolishing. Therefore, generation of ions such as a sodium and potassiumwhich cause corrosion can be prevented.

(e) First Polishing (Principal Surface Polishing) Process

The first polishing is performed to the ground principal surface of thesheet glass material G (Step S50). The first polishing is intended toremove the flaw left on the principal surface and the deformation.

For example, the first polishing has the machining allowance of severalmicrometers to about 10 micrometers. In the manufacturing method of theembodiment, because the grinding process having the large machiningallowance is not performed, the flaw and deformation that may be causedby the grinding process are not generated for the sheet glass materialG. Therefore, the machining allowance can be reduced in the firstpolishing process.

A double-side polishing apparatus 3 illustrated in FIG. 9 is used in thefirst polishing process and the subsequent second polishing process.With the double-side polishing apparatus 3, the polishing is performedusing a polishing pad 10 by relatively moving the sheet glass material Gand the polishing pad 10.

FIG. 9A is an explanatory view of a driving mechanism of the double-sidepolishing apparatus, while FIG. 9B is a sectional view of a main part ofthe double-side polishing apparatus including upper and lower surfaceplates. As illustrated in FIG. 9A, the double-side polishing apparatus 3includes a polishing carrier attaching unit, an upper surface plate 31,and a lower surface plate 32. The polishing carrier attaching unitincludes internal gear 34 and a sun gear 35, which are rotated at apredetermined rotation ratio. The upper surface plate 31 and the lowersurface plate 32 are reversely rotated while sandwiching the polishingcarrier attaching unit therebetween. The polishing pads 10 adhere to thesurfaces of the upper surface plate 31 and the lower surface plate 32that are facing each other. A polishing carrier 33 is attached so as toengage the internal gear 34 and the sun gear 35, and the polishingcarrier 33 performs planet gear movement in which the polishing carrier33 rotates while revolving around the sun gear 35.

The plural sheet glass materials G are retained in the polishing carrier33. The upper surface plate 31 can vertically be moved, and the uppersurface plate 31 presses the polishing pad 10 against the pair ofprincipal surfaces of the sheet glass material G as illustrated in FIG.9B. While slurry (polishing solution) including the polishing abrasivegrain (polishing material) is supplied, the sheet glass material G andthe polishing pad 10 are relatively moved by the planet gear movement ofthe polishing carrier 33 and the mutual reverse rotations of the uppersurface plate 31 and lower surface plate 32, thereby polishing the pairof principal surfaces of the sheet glass material G.

In the first polishing process, for example, a hard resin polisher isused as the polishing pad, and a cerium oxide abrasive grain is used asthe polishing material.

(f) Chemically Strengthening Process

After the first polishing, the sheet glass material G is chemicallystrengthened (Step S60).

For example, a mixed solution of potassium nitride (60%) and sodiumsulfate (40%) can be used as a chemically strengthening solution. In thechemically strengthening, for example, the chemically strengtheningsolution is heated to 300° C. to 400° C., the washed sheet glassmaterial G is pre-heated to 200° C. to 300° C., and the sheet glassmaterial G is dipped in the chemically strengthening solution for threeto four hours. Preferably, in order that the whole principal surfaces ofthe sheet glass material G are chemically strengthened, the dipping isperformed while the plural sheet glass materials G are accommodated in aholder by retaining the sheet glass materials G at the end faces.

When the sheet glass material G is dipped in the chemicallystrengthening solution, the lithium ion and the sodium ion in thesurface layer of the sheet glass material G are replaced with the sodiumion and the potassium ion which have relatively large ion radiuses inthe chemically strengthening solution, respectively, thereby forming acompressive stress layer having a thickness of about 50 to 200 μm.Therefore, the sheet glass material G is strengthened to have goodimpact resistance. The sheet glass material G to which the chemicallystrengthening treatment is performed is washed. For example, afterwashing the sheet glass material G using the sulfuric acid, the sheetglass material G is washed using pure water and IPA (isopropyl alcohol).

(g) Second Polishing (Final Polishing) Process

Then second polishing is performed to the sheet glass material G towhich the chemically strengthening treatment and washing aresufficiently performed (Step S80). For example, the second polishing hasthe machining allowance of about 1 μm.

The second polishing is intended at the mirror-surface polishing of theprincipal surface. In the second polishing process, similarly to thefirst polishing process, the polishing is performed to the sheet glassmaterial G using the double-side polishing apparatus 3 (see FIG. 9).However, the second polishing process differs from the first polishingprocess in the polishing abrasive grain included in the polishingsolution (slurry) used and a composition of the polishing pad 10. In thesecond polishing process, compared with the first polishing process, theparticle diameter of the polishing abrasive grain used is decreased andhardness of the polishing pad 10 is softened. For example, in the secondpolishing process, a soft foaming resin polisher is used as thepolishing pad, and a cerium oxide abrasive grain that is finer than thecerium oxide abrasive grain used in the first polishing process is usedas the polishing material.

The sheet glass material G polished through the second polishing processis washed again. The washing is performed using neutral detergent, purewater, and IPA.

The glass substrate for magnetic disk 2 having the surface irregularity,in which the flatness of the principal surface is 4 μm or less and theroughness of the principal surface is 0.2 nm or less, is obtained by thesecond polishing.

Then, as illustrated in FIG. 1, the layers such as the magnetic layerare deposited on the glass substrate for magnetic disk 2 to prepare themagnetic disk 1.

The flow of the manufacturing method illustrated in FIG. 3 is describedabove.

As described above, according to the manufacturing method of theembodiment, the sheet glass material having the surface irregularity inwhich principal surface flatness is 4 μm or less and the principalsurface roughness is 0.01 μm or less, can be formed by the press formingprocess. Therefore, the grinding process for improving the flatness andthe grinding process having the machining allowance as large as about200 μm are omitted after the press forming. Obviously, with themanufacturing method of the embodiment, because the sheet glass materialis not produced by the floating method, the tin diffusion layer is notformed in the principal surface, and a grinding process is not thereforerequired to remove the tin diffusion layer. In the first polishingprocess and second polishing of the process manufacturing method of theembodiment, the sheet glass material G has the machining allowance assmall as about 10 μm, and the machining allowance is smaller than thethickness (about 50 to 200 μm) of the compressive stress layer.Therefore, there is not generated the conventional “roll-off problem”that is caused by the large machining allowance in the grinding processand therefore the large machining allowance in the polishing process.

The good impact resistance is obtained by the compressive stress layerthat is formed through the chemically strengthening process after thepress forming. Obviously, with the manufacturing method of theembodiment, the imbalance of the compressive stress layer caused due tothe tin diffusion layer formed only on one side of the principalsurfaces, does not occur because the sheet glass material is notproduced by the floating method.

According to the manufacturing method of the embodiment, the glasssubstrate for magnetic disk having the good surface irregularityaccuracy and impact resistance can efficiently be produced.

In the flow of FIG. 3, the chemically strengthening (Step S60) isperformed between the first polishing (Step S50) and the secondpolishing (Step S70). However the sequence is not limited to theembodiment. As long as the second polishing process (Step S70) isperformed after the first polishing process (Step S50), the chemicallystrengthening (Step S60) may appropriately be replaced. For example, thefirst polishing process, the second polishing process, and thechemically strengthening process (hereinafter, the process sequence 1)may be performed in this order. However, in the process sequence 1,because the surface irregularity that is possibly generated by thechemically strengthening process is not removed, the process sequenceillustrated in FIG. 3 is performed more preferably.

EXAMPLES Examples and Comparative Examples

Hereinafter, the effectiveness of the method illustrated in FIG. 3 wasconfirmed by Examples and Comparative examples.

In Examples and Comparative examples, the alminosilicate glass (57 to74% SiO₂, 0 to 2.8% ZnO₂, 3 to 15% Al₂O₃, 7 to 16% LiO₂, and 4 to 14%Na₂O) was used as the glass material.

The magnetic layer was formed on the prepared glass substrate usingin-line type sputtering apparatus. Specifically, the CrTi adhesivelayer, the CoTaZr/Ru/CoTaZr soft magnetic layer, the CoCrSiO₂ granularnon-magnetic underlying layer, the CoCrPt—SiO₂.TiO₂ granular magneticlayer, and the carbon hydride protective layer were sequentiallydeposited on both the principal surfaces of the glass substrate. Thenthe perfluoropolyether lubricant layer was deposited on the depositeduppermost layer by a dipping method, thereby obtaining the magneticdisk.

Examples 1 to 5

The glass substrate was prepared through Steps S20 to S70 illustrated inFIG. 3 using the sheet glass material having the principal surfaceflatness of 4 μm or less and the principal surface roughness rangingfrom 0.001 μm to 0.01 μm. The sheet glass material was formed by thepress forming method illustrated in FIGS. 4 and 5.

Comparative Examples 1 to 6

The glass substrate was prepared through Steps S20 to S70 illustrated inFIG. 3 using the sheet glass material having the principal surfaceflatness of 4 μm or less and the principal surface roughness rangingfrom 0.011 μm to 1.334 μm. The sheet glass material was formed by thepress forming method illustrated in FIGS. 4 and 5.

Comparative Examples 7 and 8

The glass substrate was prepared through Steps S20 to S70 illustrated inFIG. 3 using the sheet glass material having the principal surfaceflatness of 4 μm or less and the principal surface roughness rangingfrom 0.001 μm to 0.002 μm. The sheet glass material was formed by thefloating method.

Comparative Examples 9 to 11

The glass substrate was prepared through Steps S20 to S70 illustrated inFIG. 3 using the sheet glass material having the principal surfaceflatness exceeding 4 μm and the principal surface roughness ranging from0.004 μm to 0.006 μm. The sheet glass material was formed by theconventional press method.

The conditions of the grinding and polishing of Examples and Comparativeexamples were set as follows:

The first polishing process: the polishing was performed using a ceriumoxide abrasive grain (average particle size; diameter of 1 μm to 2 μm)as a polishing material and a hard urethane pad as a polishing pad, andthe machining allowance of about 3 μm.

The second polishing process: the polishing was performed usingcolloidal silica (average particle size; diameter of 0.1 μm) as apolishing material and a soft polyurethane pad as a polishing pad, andthe machining allowance of about 1 μm.

The flatness and surface roughness (the flatness and surface roughnessof post-forming) of the glass substrate obtained by each of Examples andComparative examples were measured.

The LUL (Load/UnLoad) endurance test (600,000 times) was performed toevaluate floating stability of the magnetic head with respect to themagnetic disk that was prepared based on the glass substrate obtained byeach of Examples and Comparative examples. The LUL endurance test is onethat checks error occurrence, dirt of head after test, and abnormalitygeneration such as abrasion by operating the HDD (hard disk device) in acycle of lamp→ID stop→lamp→ID stop→ . . . while the HDD is placed in athermo-hygrostat of 70° C. and 80%. After the LUL test of 80000times/day×7.5 days=600000 times in which 10 HDDs were used with respectto Examples and Comparative examples, the test result was evaluated asfail when abnormality was generated even in one HDD.

Table 1 illustrates the roughness of the principal surface, formingmethod, and flatness (pre-forming and post-forming) in Examples 1 to 5and Comparative examples 1 to 11 and the LUL endurance test result (passor fail). In the surface roughness of the post-forming in Table 1, “OK”indicates that the surface roughness satisfies a criteria of 0.2 nm orless (the criteria required as the glass substrate for magnetic disk),and “NOK” indicates that the surface roughness does not satisfy thecriteria of 0.2 nm or less.

TABLE 1 Evaluation Glass material Surface Surface roughness LULroughness after endurance (JIS Flatness processing test B0601) FormingFlatness after (0.2 nm or (600000 [μm] method [μm] processing less)times) Example 1 0.001 press 1.02 1.13 OK Pass method Example 2 0.002press 3.79 3.81 OK Pass method Example 3 0.005 press 2.34 2.31 OK Passmethod Example 4 0.006 press 3.56 3.58 OK Pass method Example 5 0.010press 1.74 1.73 OK Pass method Comparative 0.011 press 2.10 2.13 NOKFail Example 1 method Comparative 0.058 press 1.47 1.49 NOK Fail Example2 method Comparative 0.188 press 3.93 3.80 NOK Fail Example 3 methodComparative 0.361 press 3.52 3.56 NOK Fail Example 4 method Comparative0.956 press 2.94 2.96 NOK Fail Example 5 method Comparative 1.334 press3.70 3.71 NOK Fail Example 6 method Comparative 0.001 floating 1.83 4.08OK Fail Example 7 method Comparative 0.002 floating 2.05 6.95 OK FailExample 8 method Comparative 0.005 press 4.13 4.11 OK Fail Example 9method Comparative 0.004 press 7.39 7.41 OK Fail Example 10 methodComparative 0.006 press 10.52 10.38 OK Fail Example 11 method

As can be seen from Table 1, when the glass material formed by the pressforming method illustrated in FIGS. 4 and 5 has the flatness of 4 μm orless and the surface roughness of 0.01 μm or less (Examples 1 to 5), thesurface roughness reaches the criteria (0.2 nm or less) only by thefirst polishing process and the second polishing process. In such cases,the glass material passes the LUL endurance test.

On the other hand, as can be seen from Table 1, when the glass materialformed by the press forming method illustrated in FIGS. 4 and 5 has theflatness of 4 μm or less and the surface roughness exceeding 0.01 μm(Comparative examples 1 to 6), the surface roughness does not reach thecriteria (0.2 nm or less) only by the first polishing process and thesecond polishing process. In such cases, the glass material fails in theLUL endurance test.

As can be seen from Table 1, although the glass material formed by thefloating method (Comparative examples 7 and 8) has the good surfaceroughness and flatness, a warp is generated due to a stress differenceof the surfaces, because there is a difference of ion exchange betweenone surface in which the tin diffusion layer exists and the othersurface in which the tin diffusion layer does not exist by thechemically strengthening process, and the flatness degraded by the warpis not improved only by the first polishing process and the secondpolishing process. In such cases, the glass material fails in the LULendurance test.

As can be also seen from Table 1, when the glass material formed by theconventional press forming method has the flatness exceeding 4 μm andthe surface roughness of 0.01 μm or less (Comparative examples 9 to 11),the flatness does not satisfy the criteria (4 μm or less) only by thefirst polishing process and the second polishing process. In such cases,the glass material fails in the LUL endurance test.

As is clear from Examples 1 to 5 and Comparative Examples 1 to 11, whenthe glass material formed by the press forming method of the embodimenthas the flatness of 4 μm or less and the surface roughness of 0.01 μm orless, the surface roughness and the flatness satisfy the criterionrequired as the glass substrate for magnetic disk only by the firstpolishing process and the second polishing process without performingthe grinding process having the large machining allowance.

All examples and conditional language recited herein are intended forpedagogical purposes to aid the reader in understanding the inventionand the concepts contributed by the inventor to furthering the art, andare to be construed as being without limitation to such specificallyrecited examples and conditions, nor does the organization of suchexamples in the specification relate to a showing of the superiority andinferiority of the invention. Although the embodiment(s) of the presentinventions have been described in detail, it should be understood thatthe various changes, substitutions, and alternations could be madehereto without departing from the spirit and scope of the invention.

What is claimed is:
 1. A manufacturing method of a glass substrate for amagnetic disk, comprising: forming a sheet glass material by pressforming a lump of molten glass while sandwiching the lump from opposingsides using surfaces of a pair of dies set at approximately the sametemperature, such that the surfaces of the pair of dies are brought intoclose contact at approximately identical timing; and polishing aprincipal surface of the sheet glass material by pressing a polishingpad against the principal surface of the sheet glass material whilesupplying a polishing solution including a polishing material betweenthe sheet glass material and the polishing pad, and relatively movingthe sheet glass material and the polishing pad.
 2. A manufacturingmethod of a glass substrate for a magnetic disk according to claim 1,wherein the forming of the sheet glass material includes: press formingwhile sandwiching the lump between the surfaces of the pair of dies; andopening the pair of dies immediately thereafter.
 3. A manufacturingmethod of a glass substrate for a magnetic disk according to claim 1,wherein the principal surface of the sheet glass material has a targetflatness of 4 μm or less.
 4. A manufacturing method of a glass substratefor a magnetic disk according to claim 1, wherein the glass substrate ismanufactured without grinding.
 5. A manufacturing method of a glasssubstrate for a magnetic disk according to claim 1, wherein theprincipal surface of the sheet glass material has a roughness of 0.01 μmor less.
 6. A manufacturing method of a glass substrate for a magneticdisk according to claim 2, wherein the principal surface of the sheetglass material has a target flatness of 4 μm or less.
 7. A manufacturingmethod of a glass substrate for a magnetic disk according to claim 2,wherein the glass substrate is manufactured without grinding.
 8. Amanufacturing method of a glass substrate for a magnetic disk accordingto claim 3, wherein the glass substrate is manufactured withoutgrinding.
 9. A manufacturing method of a glass substrate for a magneticdisk according to claim 6, wherein the glass substrate is manufacturedwithout grinding.
 10. A manufacturing method of a glass substrate for amagnetic disk according to claim 2, wherein the principal surface of thesheet glass material has a roughness of 0.01 μm or less.
 11. Amanufacturing method of a glass substrate for a magnetic disk accordingto claim 3, wherein the principal surface of the sheet glass materialhas a roughness of 0.01 μm or less.
 12. A manufacturing method of aglass substrate for a magnetic disk according to claim 4, wherein theprincipal surface of the sheet glass material has a roughness of 0.01 μmor less.
 13. A manufacturing method of a glass substrate for a magneticdisk according to claim 6, wherein the principal surface of the sheetglass material has a roughness of 0.01 μm or less.
 14. A manufacturingmethod of a glass substrate for a magnetic disk according to claim 7,wherein the principal surface of the sheet glass material has aroughness of 0.01 μm or less.
 15. A manufacturing method of a glasssubstrate for a magnetic disk according to claim 8, wherein theprincipal surface of the sheet glass material has a roughness of 0.01 μmor less.
 16. A manufacturing method of a glass substrate for a magneticdisk according to claim 9, wherein the principal surface of the sheetglass material has a roughness of 0.01 μm or less.